Laser-Engraver

Irvine, CA (September 24, 2009) – Newport Corporation, a worldwide leader in laser and photonic solutions, introduces the new micromachining workstation specifically designed for high precision laser direct-writing (LDW) and patterning. The flexible device can be integrated with several lasers to produce 2- or 3-dimensional patterning and writing on virtually any material. It is simple to assemble and easy to couple with continuous-wave (CW), nanosecond (ns), and femtosecond (fs) lasers. The advanced workstation can also be used to produce submicron resolution on significantly large surface areas of the substrates.

The micromachining workstation can be customized with different lasers to perform surface and volume patterning in semiconductors, dielectrics, and biocompatible materials. The workstation configuration includes high precision linear stages which allow laser direct-writing with sub-micron resolution. This solution is primarily designed for prototyping of complex 2- and 3-dimensional microstructures in diverse fields such as photonics, microelectronics, and tissue engineering.

In other laser engraving news, the ALL NEW Vytek FX3 series gantry based laser engraving and cutting system can achieve speeds exceeding 100 IPS at accelerations greater than 10 Gs!  While other manufacturers have claimed speeds of 100 IPS, what they lack is rapid acceleration.  Vytek has combined high speed with high acceleration which results in much greater throughput for the end user, especially when running smaller jobs.